Solutions for difficult to remove substances like polishing paste, diamond polishing liquid, polymers & resins without harming the substrates they have to removed from. Suited for your desired process and formulated to meet today’s environmental regulations and beyond.
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Removing stubborn residues of liquid diamond polish and other diamond polishing compounds from precision-machined parts is a critical challenge that demands advanced, high-performance cleaning solutions…
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Effectively removing stubborn polishing paste and polishing compounds demands customized cleaning solutions that protect sensitive alloys, prevent corrosion, and deliver superior removal of polish residue for optimal part quality and performance…
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Discover safe, effective, and environmentally responsible solutions for resin and polymer residue removal, using advanced compound removers designed for industrial applications while ensuring compatibility and sustainability…
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Effective wax removal is essential in industrial cleaning processes, and INVENTEC offers advanced wax removers and compound removers tailored to ensure flawless cleaning of delicate and complex components across various cleaning methods…
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Residues from polishing pastes, diamond slurries, or resins can compromise surface quality, adhesion, and functionality. In optics, semiconductors, and medical devices, even microscopic contamination may lead to defects or failures.
Diamond polishing liquids, oxide slurries, polymer binders, and resin-based compounds are among the most difficult to eliminate. They often adhere strongly to surfaces and require specialized cleaning solutions that avoid surface damage.
INVENTEC provides dedicated cleaning solvents capable of dissolving and dispersing stubborn polishing residues. These formulations are engineered to be safe for delicate substrates such as sapphire, silicon wafers, or medical-grade alloys.
Yes. Modern formulations are optimized to remove polishing residues while protecting fragile materials like optical glass, aluminum alloys, and ceramics. They prevent micro-cracks, corrosion, or roughening of the cleaned surface.
Clean, residue-free surfaces ensure maximum adhesion and coating durability. Any remaining polishing paste or resin may act as a barrier, reducing bonding strength and compromising long-term reliability.
INVENTEC’s cleaning solutions go beyond current environmental standards such as REACH and RoHS. They reduce VOC emissions, toxicity, and waste generation while maintaining high cleaning efficiency in industrial processes.
Industries such as aerospace, optics, semiconductors, automotive, and medical devices rely on polishing paste removal to achieve defect-free surfaces, improve performance, and meet regulatory quality standards.
Yes. Specialized solvents can be integrated into ultrasonic cleaning systems, spray-in-air equipment, or immersion processes, ensuring consistent removal of abrasive residues in high-volume production lines.
Benefits include fast residue removal, reduced downtime, compatibility with sensitive substrates, and residue-free surfaces. This improves productivity, product quality, and long-term reliability.
INVENTEC offers laboratory testing, process customization, and technical support to adapt cleaning solutions to customer needs. This ensures safe removal of polishing compounds while maximizing efficiency and sustainability.
Polishing compounds removal solutions are essential in industrial cleaning where residues from polishing pastes, diamond suspensions, polymers, and resins must be removed without damaging metal, ceramic, or plastic substrates.
These solutions are formulated for precision cleaning processes, including immersion, spray, and ultrasonic techniques, ensuring complete removal of hard-to-clean residues while complying with environmental regulations and sustainability standards.
Applications are found in automotive, aerospace, and medical device industries, where surface quality, functional integrity, and reliability are critical for safety and performance.
Key BenefitsPolishing Compounds Removal ensures the safe elimination of residues such as polishing pastes, liquid diamond polishing slurries, polymers, resins, and waxes. These residues are often difficult to clean and may interfere with downstream processes or the performance of sensitive components. Dedicated Polishing Compounds Removal processes are designed to protect the substrate while achieving a high level of cleanliness.
Technical AspectsPolishing Compounds Removal solutions can be water-based, solvent-based, or hybrid chemistries adapted to different materials and processes. These advanced formulations enable the removal of liquid diamond polish, polishing paste removal, and polymer & resin removal without causing corrosion, discoloration, or substrate degradation. Compliance with current and future environmental regulations is a central aspect of these processes.
ApplicationsPolishing Compounds Removal plays a key role in electronics assembly, semiconductor packaging, optical device cleaning, and precision mechanics. These solutions are particularly suited for wax removal in microelectronics, resin removal in encapsulated devices, and ensuring optimal surface preparation for further processing such as coating, bonding, or soldering.
In automotive manufacturing, removing polishing residues from metal components and precision plastic parts ensures optimal surface finish, durability, and adhesion for coatings.
For aerospace components, removing diamond polishing liquid and other residues from titanium or aluminum alloys is critical to achieve surface integrity and maintain mission-critical reliability.
In medical devices, removing polishing pastes and resins from stainless steel instruments or precision polymer components is essential to ensure patient safety and device performance.
Inventec has a worldwide dedicated Technical Support team to help you along the different stages of our cooperation.
Depending on your request, we provide online or onsite support
In order to know if our products reach your expectations on your specific part and according to your desired process, we provide FREE-OF-CHARGE cleaning trials in our Technical Centers. A comprehensive technical report detailing all test results and recommendations regarding process & process parameters will be provided. You want to attend the trials? We are happy to welcome you.