Liquid Diamond Polish Removal Process

Our advanced liquid diamond polish removal solutions are engineered for precise, efficient elimination of abrasive residues, ensuring flawless surface integrity, enhanced component longevity, and optimal preparation for final finishing processes in critical polishing environments.

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Efficient Liquid Diamond Polish Removal for High-Precision Cleaning in Hard Material Machining


Removing stubborn residues of liquid diamond polish and other diamond polishing compounds from precision-machined parts is a critical challenge that demands advanced, high-performance cleaning solutions.

The machining and polishing of ultra-hard materials—such as tungsten carbide cutting tools and precision components—often rely on advanced abrasives like liquid diamond polish, diamond compound, and diamond polishing paste. These abrasive solutions are essential for achieving high-precision finishes, especially in demanding industrial sectors such as aerospace, automotive, and medical device manufacturing.

However, the use of diamond polishing compound presents a critical challenge: its ultra-fine particles and sticky consistency can lodge deep into the pores and cavities of metal surfaces. This makes thorough cleaning both technically demanding and essential to avoid contamination or part failure. A reliable and repeatable cleaning process is crucial, especially in fast-paced, high-volume production lines.

INVENTEC has developed a range of industrial cleaning solutions specifically engineered to remove stubborn diamond polish residues effectively. These solutions are tailored for use in operations involving diamond polishing paste and diamond compound residues and offer key advantages:

  • Exceptional cleaning performance, even in components with high porosity and complex geometries
  • Long-lasting bath life that supports continuous, high-throughput production processes
  • Compliance with strict environmental regulations and sustainable manufacturing practices

Whether you are dealing with liquid diamond polish or high-performance diamond polishing compound, INVENTEC’s innovative cleaning systems ensure reliable, residue-free results—boosting both product quality and operational efficiency.

See Other Polishing Removal Processes


PRODUCT OVERVIEW

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  • Promoclean range - our waterbased cleaners

    PROMOCLEAN TP 178

    • Removing oxides, mineral residues & diamond liquid polishing
    • Aqueous immersion process with ultrasonics
    • Substitute for phosphoric acid based cleaners

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  • TOPKLEAN MC 1007D

    • Heavy contaminants removal
    • Mono-solvent, co-solvent or spray process
    • Environmental friendly alternative to perchlorethylene & nPB
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Technical support

Inventec has a worldwide dedicated Technical Support team to help you along the different stages of our cooperation.

Depending on your request, we provide online or onsite support

  • to select the right product based on your specific needs
  • to assist you in your product qualification process
  • to guide you with the initial set up of you process at all your worldwide manufacturing facilities
  • to provide fast response on technical issues which could occur at any time during mass production.
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Free-of-Charge cleaning trials

Free-of-Charge cleaning trials

In order to know if our products reach your expectations on your specific part and according to your desired process, we provide FREE-OF-CHARGE cleaning trials in our Technical Centers. A comprehensive technical report detailing all test results and recommendations regarding process & process parameters will be provided. You want to attend the trials? We are happy to welcome you.

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