3M NOVEC 8200
- Film cleaning fluid
- Vapor phase, co-solvent, flushing & drying process
- Low surface tension
IMPORTANT NOTICE: PHASE-OUT 3M™ PRODUCTS
3M™ announced in December 2022, that all Novec™ products will be phased out and not available anymore by the end of 2025. No worries, Inventec has a drop-in replacement for this product but we recommend to contact us as soon as possible in order to minimize supply interruptions.
If you want to know more about the 3M™ products phase-out, click on the this link.
OUR ALTERNATIVE(S):
- PROMOSOLV DR4 -> Same formulation
- PROMOSOLV NEO A1 -> Similar properties & applications + NO GWP & PFAS FREE
3M Novec 8200
3M™ Novec™ 8200 Engineered Fluid is a clear, colorless, low-odor fluid intended to replace 1,1,1-trichloroethane and perchloroethylene in film cleaning applications. This fluid has zero ozone depletion potential and low global warming potential (GWP); is not a volatile organic compound (VOC). It is low in toxicity, with a time-weighted exposure guideline of 200 ppm (eight-hour average).
Novec 8200 fluid has a higher boiling point than most CFCs, HCFCs and HFCs, reducing evaporative losses. The low surface tension and increased solvency of Novec 8200 fluid, coupled with its chemical and thermal stability, nonflammability, and excellent compatibility with film substrates, make it an ideal film cleaning solvent.
Letter from 3M – Inventec authorized distributor for EMEA area
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Benefits
PERFORMANCE
- Thermal and chemical stable in use (azeotropic formulation)
- The very low surface tension allows deep rinsing of parts with complex geometry
- Short rinsing and drying times
COST
- Continuous recycling in equipment for a long bath-life
- Can be returned for recycling and re-use
- The relative high boiling point reduces risk of solvent drag, so limiting consumption
HSE
- Very low toxicity (refer to the SDS)
- No Ozon Depletion Potential (ODP) & low Global Warming Potential (GDP)
- Non-flammable
Applications
DRYING OF SEMICONDUCTOR WAFERS
Novec™ 7100 or Novec™ 71IPA are used as a drying agent for semiconductor wafers as a drop-in alternative to IPA.
Related products & services
PROMOSOLV DR3
- Light oil & particles removal / rinsing & drying
- Vapor phase, co-solvent, flushing & drying process
- Very low surface tension
- 3M Novec 7100 replacement
PROMOSOLV NEO A1
- Light oil & particles removal / rinsing & drying
- Vapor phase, co-solvent, flushing & drying process
- Very low surface tension, no GWP & PFAS free
- 3M Novec 7100 replacement